SK Hynix is gearing up for a significant leap in its semiconductor manufacturing capabilities with the planned introduction of High-NA EUV (Extreme Ultraviolet) equipment in 2026. The company is currently in the process of establishing a dedicated research and development team and expanding its workforce to support this technological advancement.

High-NA EUV technology represents a significant upgrade from the existing EUV equipment, targeting even finer processes down to the 2-nanometer scale. The 'NA' in High-NA EUV stands for numerical aperture, a measure of lens resolution that is crucial for the precision required in semiconductor manufacturing. With a numerical aperture of 0.55, compared to the 0.33 of standard EUV, High-NA EUV is expected to deliver enhanced resolution and imaging capabilities.

EUV equipment is known for its high technological complexity and cost, with ASML being the sole manufacturer capable of producing such advanced systems. Despite these challenges, the High-NA EUV, specifically the 'EXE:5000' model from ASML, has garnered significant interest from major memory companies like Intel, TSMC, Samsung Electronics, and SK Hynix. The equipment's price tag is reportedly as high as 5 trillion won.

SK Hynix's commitment to adopting this technology by 2026 reflects its ambition to remain at the forefront of semiconductor innovation. While specific plans for the facility's integration and further investment directions have not been disclosed, the introduction of High-NA EUV is anticipated to play a pivotal role in the production of next-generation DRAM, potentially leading to the mass production application in the 0a (single-digit nanometer) range.

In line with this strategic move, SK Hynix has also formed a specialized team focused on the development of High-NA EUV technology, aiming to strengthen its expertise in this domain. Although the company has not provided detailed information on organizational operations related to this initiative, the establishment of the High-NA EUV team signals a clear direction towards future technological leadership in the semiconductor industry.